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Plasma enhanced chemical vapor deposition system for silicon oxide and nitride films 1 set
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Tender Detail
Plasma enhanced chemical vapor deposition system for silicon oxide and nitride films 1 set
Tendering Authority
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Tender Category
Other
Publish Date
25 Apr 2026
Deadline
16 Jun 2026
Country
Japan
TenderNews Ref. No.
2883116260425-0
Document Fees
Refer Document.
EMD
Refer Document.
Tender Value
Refer Document.
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