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Chamber for the deposition of thin semiconductor layers of III V nitrides, with very good uniformit
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Tender Detail
Chamber for the deposition of thin semiconductor layers of III V nitrides, with very good uniformity on large surfaces, using magnetron sputtering techniques (Deposition Chamber)
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Tender Category
Other
Publish Date
07 Oct 2025
Deadline
10 Nov 2025
Country
Romania
TenderNews Ref. No.
2398116251007-0
Document Fees
Refer Document.
EMD
Refer Document.
Tender Value
RON 1947666
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