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High temperature and high density silicon oxide atomic layer chemical vapor deposition equipment Si
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Tender Detail
High temperature and high density silicon oxide atomic layer chemical vapor deposition equipment Silica thin film chemical vapor deposition equipment with back-end plasma enhanced mode using tetraethyl silicate as reactant Silica thin film chemical
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Tender Category
Other
Publish Date
06 Aug 2020
Deadline
14 Aug 2020
Country
China
TenderNews Ref. No.
1378617200806-0
Document Fees
Refer Document.
EMD
Refer Document.
Tender Value
Refer Document.
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