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Polycrystalline silicon vertical low-pressure chemical vapor deposition equipment High temperature
Tender Notice
Tender Detail
Polycrystalline silicon vertical low-pressure chemical vapor deposition equipment High temperature silicon oxide vertical low pressure chemical vapor deposition equipment Channel filling thick silicon oxide atomic layer deposition equipment Channel
Tendering Authority
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Tender Category
Other
Publish Date
06 Aug 2020
Deadline
18 Aug 2020
Country
China
TenderNews Ref. No.
1376817200806-0
Document Fees
Refer Document.
EMD
Refer Document.
Tender Value
Refer Document.
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