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High-temperature high-density silicon oxide atomic layer chemical vapor deposition equipment Silica
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Tender Detail
High-temperature high-density silicon oxide atomic layer chemical vapor deposition equipment Silica film chemical vapor deposition equipment using tetraethyl silicate as reactant in the back-end plasma enhanced mode Silica film chemical vapor depos
Tendering Authority
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Tender Category
Other
Publish Date
06 Aug 2020
Deadline
14 Aug 2020
Country
China
TenderNews Ref. No.
1375617200806-0
Document Fees
Refer Document.
EMD
Refer Document.
Tender Value
Refer Document.
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