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Silica thin film chemical vapor deposition equipment using tetraethyl silicate as reactant in front
Tender Notice
Tender Detail
Silica thin film chemical vapor deposition equipment using tetraethyl silicate as reactant in front-end plasma enhanced mode 1
Tendering Authority
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Tender Category
Other
Publish Date
06 Aug 2020
Deadline
31 Aug 2020
Country
China
TenderNews Ref. No.
1375417200806-0
Document Fees
Refer Document.
EMD
Refer Document.
Tender Value
Refer Document.
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